推薦主題
查看: 2899|回復: 0
打印 上一主題 下一主題

幸运快三买什么不出什么: 通過傾斜旋轉的圓形剝離陰影或鏤空掩模進行蒸發

[復制鏈接] qrcode

41

主題

42

帖子

223

積分

超級版主

Rank: 8Rank: 8

積分
223
樓主
跳轉到指定樓層
發表于 2018-12-27 08:57:22 | 只看該作者 回帖獎勵 |倒序瀏覽 |閱讀模式
On evaporation via an inclined rotating circular lift-off shadow or stencil mask
通過傾斜旋轉的圓形剝離陰影或鏤空掩模進行蒸發
Journal of Vacuum Science & Technology B 37, 011602 (2019);

https://doi.org/10.1116/1.5057404

Steve Arscotta)
Hide Affiliations
Institut d’Electronique, de Microélectronique et de Nanotechnologie (IEMN), CNRS UMR8520, University of Lille, Cité Scientifique, Avenue Poincaré, 59652 Villeneuve d’Ascq, France
a)Electronic mail: [email protected]

ABSTRACT

A mathematical model is developed to calculate the topography of a mesa obtained by evaporation of matter via inclined rotating lift-off shadow masking. Two types of masking are considered: a circular mask and a cylindrical mask—the latter involves sidewall deposition. The model is able to predict various topographic profiles obtained via the evaporative deposition of matter, e.g., metals, when using a physical mask, e.g., a photoresist or an electron beam-sensitive resist patterned onto a flat wafer. The model predicts a range of profiles, e.g., sharp cones, round-tipped cones, spikes, irregular bumps, flat-topped features, “bagel-shaped” features, flat rings, and cylinders (fixed to the wafer and releasable)—depending on the aspect ratio of the circular opening, the deposition thickness, and the evaporation tilt angle. The ideas are extended to model an idealized resist-based lift-off mask involving overhang and undercut features. The model is simple to implement and should be of use for predicting the shape of deposited matter when using lift-off and stencil procedures—even at sub-micrometer dimensions. Despite its simplicity, the model goes some way in helping to understand the sensitivity of the various parameters on the final topography of the deposited matter. For example, the tilt angle—even when small—has an influence on the curvature radius of cone tips. In this way, the prediction—and even optimization—of the shape of the deposited material is possible prior to embarking on time-consuming, and perhaps costly, experimentation.



        本文開發了一種數學模型來計算一種由蒸發物質而得到的臺面的形貌,蒸發是通過傾斜旋轉剝離陰影掩模實施的??悸橇肆街擲嘈偷難諛#涸殘窩諛:馱倉窩諛?- 后者涉及側壁沉積。當使用物理掩模(例如,光致抗蝕劑或平坦晶片上圖案化了的電子束敏感抗蝕劑)時,該模型能夠預測通過蒸發沉積獲得的物質(例如金屬)的各種形貌分布。該模型預測了一系列分布的范圍,例如尖錐、圓頂錐、尖峰、不規則凸起,平頂特征形、“百吉餅形”特征形,扁平環和圓柱體(固定在晶圓上并可釋放) - 這取決于圓形開口的縱橫比,沉積厚度和蒸發傾斜角。這些想法被擴展到模型化理想的基于抗蝕劑的剝離掩模,其包括懸垂和側凹特征的掩模。該模型易于實施,并且在使用剝離和鏤空工序時預測沉積物的形狀 - 即使在亞微米尺寸下也能使用。盡管該模型很簡單,但它在某種程度上有助于理解各種參數對沉積物質最終形貌的敏感性。例如,傾斜角 - 即使很小 - 對錐形尖端的曲率半徑會有影響。這樣,在投入耗時且昂貴的實驗之前,就可以預測,甚至優化沉積材料的形狀。

本帖子中包含更多資源

您需要 登錄 才可以下載或查看,沒有帳號?立即注冊

x
分享至 : QQ空間
0 人收藏
您需要登錄后才可以回帖 登錄 | 立即注冊

本版積分規則

快速回復 幸运和幸运快三开奖助手官方 返回列表